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Strain is one of the important factors affecting the two-dimensional electron gas (2DEG) transform in AlGaN/GaN material based high electron mobility transistors (HEMTs) by polarization effects. In this paper, the effects of inhomogeneous biaxial strain in different regions of the AlGaN barrier layer on electrical properties of normally-off HEMTs with p-GaN gate were discussed. The results show that biaxial strain applied in three regions has different influence on transfer, output and breakdown characteristics of the device. The strain applied in region under gate has the most significant impact on threshold voltage and drain saturation current with a decreasing of 39% and an increasing of 97% respectively as the strained lattice constant increases from 3.173061Å to 3.187229Å.While, strain applied between gate and drain electrode can improve the off-state breakdown voltage by 12% with the increasing of strained lattice constant.

Simulation of Electrical Characteristics on Inhomogeneous Strains in Normally-off HEMTs with p-GaN Gate