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Among a variety of applications of organometallic compounds, their use as MOCVD precursors is one of the most extensive areas. To our minds, one of the most powerful and accurate methods for evaluation and prediction of thermal behaviour of the precursor is mass-spectrometry coupled with mass-analyzed ion kinetic energy spectrometry. Traditionally, both structure and composition of deposited materials and the precursor's thermal decomposition channels were controlled by gas-phase composition, the process temperature and pressure, i.e. by external factors. A possibility of such a control via inner factors - i.e. structure of a specially designed precursors is demonstrated for a series of new mixed-ligand organometallic compounds of In, Zr and Hf

Structure and Destruction of a Precursor : Mass-Spectrometric Evaluation of Creation of Functional Films with Predeterminated Composition