English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Zendy Plus

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Zendy Tools

Zendy Open

The kinetic study of the chemical vapour deposition of Si3N4 on graphite substrates by low pressure pyrolysis of tetramethylsilane-ammonia-hydrogen mixtures is conducted in a hot wall reactor. The experimental conditions allowing the control of the deposition rate by the surface chemical reaction are defined. The structure and composition of the corresponding films are described

KINETICS OF THE CHEMICAL VAPOR DEPOSITION OF SILICON NITRIDE-FROM Si(CH3)4/ NH3/H2 GAS MIXTURES

KINETICS OF THE CHEMICAL VAPOR DEPOSITION OF SILICON NITRIDE-FROM Si(CH₃)₄/ NH₃/H₂ GAS MIXTURES