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A deep ultraviolet femtosecond laser was employed to trim phase and birefringence errors in silica planar lightwave circuits. A permanent refractive index change of ∼3.8 × 10 -4 and a birefringence change of 1.0 × 10 -4 were induced in hydrogen-free Mach-Zehnder planar waveguide circuits. The ultrafast laser enhances the ultraviolet photo-sensitivity response in silica waveguides by two orders of magnitude greater than that of a nanosecond 248 nm KrF excimer laser

Trimming phase and birefringence errors in planar lightwave circuits with deep ultraviolet femtosecond laser