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A new technique for UV direct writing of Bragg gratings in planar silica is presented. In this method the Bragg gratings and the channels are defined simultaneously, conferring advantages in flexibility of design and grating performance. Photosensitive Germanium doped silica-on-silicon produced by Flame Hydrolysis Deposition was used.

Fabrication of directly UV-written channel waveguides with simultaneously defined integral Bragg gratings