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We use a top-graphene layer to protect QD surface ligands during the lithography process, allowing reliable patterning of hybrid Gr/QD photodetectors  via  lithography and dry etching.

nanoscale advances

High resolution patterning of PbS quantum dots/graphene photodetectors with high responsivity <i>via</i> photolithography with a top graphene layer to protect surface ligands

High resolution patterning of PbS quantum dots/graphene photodetectors with high responsivity via photolithography with a top graphene layer to protect surface ligands