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A new ALD process using easily synthesized CoCl 2 (TMEDA) and H 2 S enables deposition of ultrathin, highly conductive and thermally stable Co 9 S 8  films selectively on SiO 2  without growth on Si–H.

dalton transactions

Highly conductive and stable Co<sub>9</sub>S<sub>8</sub> thin films by atomic layer deposition: from process development and film characterization to selective and epitaxial growth

Highly conductive and stable Co9S8 thin films by atomic layer deposition: from process development and film characterization to selective and epitaxial growth

Highly conductive and stable Co₉S₈ thin films by atomic layer deposition: from process development and film characterization to selective and epitaxial growth