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Tris(trimethylsilyl)silane (TTMSS) is introduced as a non-toxic and kinetically superior hydrogen source for the photo-driven reduction of trithiocarbonates from poly(methyl methacrylate), polystyrene, and poly(vinyl pyridine)s (PVP)s created through RAFT polymerization. No other reagents were necessary and quantitative reduction is achieved under UV- and blue-light irradiation. PVP reduction and sequestering of chain combination events is investigated for the first time.

Catalyst free removal of trithiocarbonate RAFT CTAs from poly(vinylpyridine)s using tris(trimethylsilyl)silane and light