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We report surface characteristics of UO 2 , U 2 O 5  and UO 3  thin films after exposure to gas plasmas: a new approach of the oxidative dissolution problem.

dalton transactions

X-Ray and ultraviolet photoelectron spectroscopy studies of Uranium(<scp>iv</scp>),(<scp>v</scp>) and(<scp>vi</scp>) exposed to H<sub>2</sub>O-plasma under UHV conditions

X-Ray and ultraviolet photoelectron spectroscopy studies of Uranium(iv),(v) and(vi) exposed to H2O-plasma under UHV conditions

X-Ray and ultraviolet photoelectron spectroscopy studies of Uranium(iv),(v) and(vi) exposed to H₂O-plasma under UHV conditions