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Refractive-index (RI)-matched nanostructures are implemented in GaN-based light-emitting diodes (LEDs) for enhancing light output efficiency. The RI-matched indium tin oxide (ITO) nanostructures are successfully implemented in GaN-based lateral LEDs by using ITO sol–gel and nanoimprint lithography. The ITO sol–gel nanostructures annealed at 300 °C have RI of 1.95, showing high transparency of 90% and high diffused transmittance of 34%. Consequently, the light output power in LEDs with the RI-matched nanostructures increases by 8% in comparison with that in LEDs containing flat ITO. Ray tracing and finite-difference time-domain (FDTD) simulations show that the RI-matched nanostructures on the transparent current spreading layer dramatically reduce Fresnel reflection loss at the interface of the current spreading layer with the nanostructure and extract confined waveguide lights in LEDs.

Nano-imprinting of refractive-index-matched indium tin oxide sol–gel in light-emitting diodes for eliminating total internal reflection