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We report the synthesis of large-area monolayer MoSe 2  films extended up to a millimeter scale on SiO 2 /Si substrates by atmospheric pressure chemical vapor deposition (CVD).

Large-area synthesis of monolayer MoSe2 films on SiO2/Si substrates by atmospheric pressure chemical vapor deposition

Large-area synthesis of monolayer MoSe₂ films on SiO₂/Si substrates by atmospheric pressure chemical vapor deposition