English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Tools annual

Global: Zendy Free Plan

Global: Zendy Tools monthly

Global: Zendy Plus monthly

Ion implantation is widely used to fabricate advanced optical and optoelectronic materials and devices. However, nanoscale defects generated during the ion implantation process severely affect the quality and properties of the material and device. Here, combining computational simulations and experiments, we investigate the mechanism for defect repair in fused silica after Cu ion implantation using femtosecond laser irradiation with an energy fluence much lower than the ablation threshold. Atomic force microscopy demonstrates no unexpected ablation. The optical absorption spectra show that various types of defects with formation energies between 1.9 and 6.2 eV can be repaired successfully via an athermal procedure. The Raman spectra imply that the broken chemical bonds reconnect after femtosecond laser irradiation. Our study reveals that low-energy femtosecond laser irradiation can transfer the appropriate energy needed to repair defects; thus it could be useful in fabricating nonlinear optical devices due to its high spatial selectivity and convenience.

Athermal repair of nanoscale defects in optical materials using a femtosecond laser