English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Plus monthly

Global: Zendy Tools annual

Global: Zendy Tools monthly

Global: Zendy Free Plan

Rate coefficients have been determined in a large photoreactor for the reaction of OH radicals and Cl atoms with tetraethoxysilane (TEOS, (CH3CH2O)4Si) using a relative kinetic method and in situ FTIR spectroscopy for the analysis. Values of (2.99 ± 0.37) × 10−11 and (2.41 ± 0.47) × 10−10 cm3 per molecule per s were obtained for the reactions of OH and Cl with TEOS, respectively, at 298 K and atmospheric pressure. The products originating from the OH-radical and Cl-atom initiated oxidation of TEOS have also been investigated. Acetic acid (CH3C(O)OH) is observed as a major product in both cases with a molar yield of (95 ± 4)%. An oxidation mechanism is proposed to explain its formation and the possible identity of the co-product(s) is discussed.

Gas-phase kinetic and mechanistic investigation of the OH radical and Cl atom oxidation of tetraethoxysilane