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We report an interesting magnetic behavior of a Co film (thickness ~ 350{\AA}) grown on Si/Ti/Cu buffer layer by electro-deposition (ED) technique.Using depth sensitive X-ray reflectivity and polarized neutron reflectivity(PNR) we observed two layer structures for the Co film grown by ED with asurface layer (thickness ~ 100 {\AA}) of reduced density (~ 68% of bulk)compared to rest of the Co film (thickness ~ 250 {\AA}). The two layerstructure is consistent with the histogram profile obtained from atomic forcemicroscope (AFM) of the film. Interestingly, using PNR, we found that themagnetization in the surface Co layer is inversely (antiferomagnetically)coupled (negative magnetization for surface Co layer) with the rest of the Colayer for the ED grown film. While we compare PNR result for a Co film ofsimilar layered structure grown by sputtering, the film showed a uniformmagnetization as expected. We also show that the depth dependent unusualmagnetic behavior of ED grown Co film may be responsible for anomalousanisotropic magnetoresistance observed in low field in this film as compared tothe Co film grown by sputtering. Combining X-ray scattering, AFM,superconducting quantum interface device magnetometry (SQUID), PNR andmagneto-transport measurements we attempted to correlate and compare thestructural, magnetic and morphological properties with magneto-transport of Cofilms grown by ED and sputtering. The study indicates that the interestingsurface magnetic property and magneto-transport property of the ED film iscaused by its unique surface morphology.

Antiferromagnetic Coupling between Surface and Bulk Magnetization and Anomalous Magnetic Transport in Electro-deposited Co Film