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The formation of nano-hillocks on CaF2 crystal surfaces by individual ionimpact has been studied using medium energy (3 and 5 MeV) highly charged ions(Xe19+ to Xe30+) as well as swift (kinetic energies between 12 and 58 MeV)heavy ions. For very slow highly charged ions the appearance of hillocks isknown to be linked to a threshold in potential energy while for swift heavyions a minimum electronic energy loss is necessary. With our results we bridgethe gap between these two extreme cases and demonstrate, that with increasingenergy deposition via electronic energy loss the potential energy threshold forhillock production can be substantially lowered. Surprisingly, both mechanismsof energy deposition in the target surface seem to contribute in an additiveway, as demonstrated when plotting the results in a phase diagram. We show thatthe inelastic thermal spike model, originally developed to describe suchmaterial modifications for swift heavy ions, can be extended to case wherekinetic and potential energies are deposited into the surface.

Energy deposition by heavy ions: Additivity of kinetic and potential energy contributions in hillock formation on CaF2