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The field of plasmonics seeks to find materials with an intensive plasmon(large plasmon pole weight) with low Landau, phonon and other losses (smalldecay width). In this paper we propose a new class of materials that showexceptionally good plasmonic properties. These materials consist of van derWaals stacked 'plasmon active' layers (atomically thin metallic layers) and'supporting' layers (atomically thin wide band gap insulating layers). One suchmaterial that can be experimentally realized - lithium intercalated hexagonalboron-nitride is studied in detail. We show that its 2D plasmon intensity issuperior to intensity of well studied Dirac plasmon in heavy doped graphenewhich is hard to achieve. We also propose the method for computationally verycheap, but accurate analysis of plasmon spectra in such materials, based on oneband tight-binding approach and effective background dielectric function.

Strong two-dimensional plasmon in Li-intercalated hexagonal boron-nitride film with low damping