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Nanoporous anatase TiO 2  films were fabricated by a screen-printing method, and Cu x O quantum dots (QDs) were deposited on the TiO 2  films through successive ionic layer adsorption and reaction (SILAR). The amount of Cu x O QDs on the TiO 2  films are controlled by changing the number of SILAR cycles. The morphology, microstructure, optical, and photoelectrochemical properties of different Cu x O sensitized TiO 2  films (Cu x O/TiO 2 ) were investigated in detail. The nanoporous TiO 2  film offers a large surface area for anchoring QDs. QD deposited samples exhibited a significant improvement in photoelectrochemical performance than the bare of TiO 2 . Cu x O/TiO 2 , prepared with 7 SILAR cycles, showed the best photoelectrochemical properties, where the photocurrent density was enhanced to 500.01 μA/cm 2  compared with 168.88 μA/cm 2  of bare TiO 2  under visible light. These results indicate that the designed Cu x O/TiO 2  structure possesses superior charge separation efficiency and photoelectrochemical properties.

Enhanced photoelectrochemical properties of nanocrystalline TiO2 electrode by surface sensitization with CuxO quantum dots