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A standard paradigm of localization microscopy involves extension from two tothree dimensions by engineering information into emitter images, andapproximation of errors resulting from the field dependence of opticalaberrations. We invert this standard paradigm, introducing the concept of fullyexploiting the latent information of intrinsic aberrations by comprehensivecalibration of an ordinary microscope, enabling accurate localization of singleemitters in three dimensions throughout an ultrawide and deep field. Tocomplete the extraction of spatial information from microscale bodies rangingfrom imaging substrates to microsystem technologies, we introduce a synergisticconcept of the rigid transformation of the positions of multiple emitters inthree dimensions, improving precision, testing accuracy, and yieldingmeasurements in six degrees of freedom. Our study illuminates the challenge ofaberration effects in localization microscopy, redefines the challenge as anopportunity for accurate, precise, and complete localization, and elucidatesthe performance and reliability of a complex microelectromechanical system.

Accurate localization microscopy by intrinsic aberration calibration