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Deep subwavelength integration of high-definition plasmonic nanostructures isof key importance for the development of future optical nanocircuitry forhigh-speed communication, quantum computation and lab-on-a-chip applications.So far the experimental realization of proposed extended plasmonic networksconsisting of multiple functional elements remains challenging, mainly due tothe multi-crystallinity of commonly used thermally evaporated gold layers.Resulting structural imperfections in individual circuit elements willdrastically reduce the yield of functional integrated nanocircuits. Here wedemonstrate the use of very large (>100 micron^2) but thin (<80 nm) chemicallygrown single-crystalline gold flakes, which, after immobilization, serve as anideal basis for focused-ion beam milling and other top-down nanofabricationtechniques on any desired substrate. Using this methodology we obtainhigh-definition ultrasmooth gold nanostructures with superior opticalproperties and reproducible nano-sized features over micrometer length scales.Our approach provides a possible solution to overcome the current fabricationbottleneck and to realize high-definition plasmonic nanocircuitry.

Atomically flat single-crystalline gold nanostructures for plasmonic nanocircuitry