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Planned nanopatterns of [Au55(Ph2PC6H4SO3Na)12Cl6] clusters are generated on smooth silicon surfaces using a “bottom-up” fabrication methodology based on the selective self-assembly of the gold clusters on purpose-designed organic template patterns themselves fabricated via a hierarchical layer-by-layer self-assembly strategy. The patterns are laterally defined by constructive nanolithography, a novel surface patterning process utilizing conductive AFM tips as nanoelectrochemical “pens”, with which nanoscale chemical information is inscribed in a nondestructive manner (in the form of a localized chemical transformation) on the top surface of a highly ordered organosilane monolayer self-assembled on silicon. Development of the initial tip-imprinted information is achieved via further self-assembly and chemical derivatization steps. This generic all-chemical approach offers attractive options for the advancement of nanofabrication capabilities that might have real impact on future technologies.

Template Guided Self-Assembly of [Au55] Clusters on Nanolithographically Defined Monolayer Patterns

Template Guided Self-Assembly of [Au₅₅] Clusters on Nanolithographically Defined Monolayer Patterns