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The chemistry of methyl bromide on Cu/Ru(001) has been studied utilizing work function change (Δφ) and temperature-programmed desorption (TPD) measurements. The remarkable modification in the methyl fragments dehydrogenation at the completion of a single copper layer and the significant difference in reactivity of the Cu(2 ML)/Ru(001) or Cu(111) surfaces are the focus of this study. A decrease in work function at the completion of 1 ML CH3Br of 2.15 ± 0.02 eV and 1.33 ± 0.05 eV was measured, respectively, for Ru(001) and Cu(2 ML)/Ru(001) held at 82 K. Methyl bromide does not dissociate upon adsorption on clean or the copper-covered surfaces, and it is bound with the bromine down. Copper modifies the reactivity of the Ru substrate, gradually decreasing the dissociated fraction of CH3Br from 0.55 of the initial one monolayer on clean Ru(001) to 0.06 on Cu(2 ML)/Ru(001), probably because of defects in the copper layer. The methyl fragment dehydrogenation rate slows as the copper coverage increases. At a narr...

Surface Chemistry of CH3Br and Methyl Modified by Copper Deposition on Ru(001)

Surface Chemistry of CH₃Br and Methyl Modified by Copper Deposition on Ru(001)