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International audienceThis study deals with the growth mode of N,N’-dipenthyl-3,4,9,10-perylenetetracarboxylic diimide(PTCDI-5C) thin films from less than one monolayer to 23 monolayers thick. The effects of growthtemperature and the thickness and nature of the substrates —SiO 2 on Si(001) oroctadecyltrichlorosilane (OTS) self-assembled monolayer terminated Si(001) surfaces— arediscussed. Thin films were deposited from a home-made Knudsen cell by using a hot-walldeposition technique. Films were analyzed by atomic force microscopy, X-ray diffraction, and X-rayreflectivity. Films exhibited a (001) orientation with a 1.63 nm d spacing, and a metastable thin filmphase was observed without any distinction of the nature of the substrate. However, differences werenoticed in the early stages of growth: PTCDI-5C/SiO 2 first monolayers presented a Stranski-Krastanov growth mode, whereas PTCDI-5C/OTS first monolayers showed a more complex mode with incomplete wetting of the substrate surface. Differences between the two morphologiessoftened as the film thickness increased

Early Stage of Growth of a Perylene Diimide Derivative Thin Film Growth on Various Si(001) Substrates