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Atmospheric pressure chemical vapor deposition (APCVD) has been usedextensively for synthesizing two-dimensional (2D) materials, due to its lowcost and promise for high-quality monolayer crystal synthesis. However, theunderstanding of the reaction mechanism and the key parameters affecting theAPCVD processes is still in its embryonic stage. Hence, the scalability of theAPCVD method in achieving large scale continuous film remains very poor. Here,we use MoSe2 as a model system and present a fluid guided growth strategy forunderstanding and controlling the growth of 2D materials. Through theintegration of experiment and computational fluid dynamics (CFD) analysis inthe full-reactor scale, we identified three key parameters: precursor mixing,fluid velocity and shear stress, which play a critical role in the APCVDprocess. By modifying the geometry of the growth setup, to enhance precursormixing and decrease nearby velocity shear rate and adjusting flow direction, wehave successfully obtained inch-scale monolayer MoSe2. This unprecedentedsuccess of achieving scalable 2D materials through fluidic design lays thefoundation for designing new CVD systems to achieve the scalable synthesis ofnanomaterials.

Fluid Guided CVD Growth for Large-scale Monolayer Two-dimensional Materials