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Origami design principles are scale invariant and enable directminiaturization of origami structures provided the sheets used for folding haveequal thickness to length ratios. Recently, seminal steps have been taken tofabricate microscale origami using unidirectionally actuated sheets withnanoscale thickness. Here, we extend the full power of origami-inspiredfabrication to nanoscale sheets by engineering bidirectional folding with 4 nmthick atomic layer deposition (ALD) SiNx-SiO2 bilayer films. Straindifferentials within these bilayers result in bending, producing microscopicradii of curvature. We lithographically pattern these bilayers and localize thebending using rigid panels to fabricate a variety of complex micro-origamidevices. Upon release, these devices self-fold according to prescribedpatterns. Our approach combines planar semiconductor microfabrication methodswith computerized origami design, making it easy to fabricate and deploy suchmicrostructures en masse. These devices represent an important step forward inthe fabrication and assembly of deployable micromechanical systems that caninteract with and manipulate micro- and nanoscale environments.

Bidirectional Self-Folding with Atomic Layer Deposition Nanofilms for Microscale Origami