
Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
Author(s) -
Maria Antonietta Mione,
Vincent Vandalon,
Alfredo Mameli,
W.M.M. Kessels,
F. Roozeboom
Publication year - 2021
Publication title -
journal of physical chemistry. c./journal of physical chemistry. c
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.401
H-Index - 289
eISSN - 1932-7455
pISSN - 1932-7447
DOI - 10.1021/acs.jpcc.1c07980
Subject(s) - infrared spectroscopy , analytical chemistry (journal) , chemistry , atmospheric pressure , spectroscopy , atomic layer deposition , desorption , atmospheric pressure plasma , infrared , plasma , adsorption , environmental chemistry , organic chemistry , layer (electronics) , oceanography , physics , quantum mechanics , optics , geology