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The thickness and interfacial geometry of hexagonal boron nitride (hBN) filmsgrown by chemical vapor deposition on polycrystalline nickel foils is studiedusing low-energy electron microscopy (LEEM). The reflectivity of the electrons,measured over an energy range of 0 - 20 eV, reveals distinct minima and maxima.The measured data is compared with simulations based on a first-principlesdescription of the electronic structure of the material. From this comparison,the number of hBN layers and the separation between the lowest hBN layer andthe nickel surface is deduced. The coupling of interlayer states of the hBN toboth image-potential and Shockley-type surface states of the nickel isdiscussed, and the dependence of the reflectivity spectra on the surfaceorientation of nickel grains is examined.

Characterization of hexagonal boron nitride layers on nickel surfaces by low-energy electron microscopy