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Conventional projection Talbot lithography usually employs opaque (amplitude)or transparent (phase) masks for creating a periodic array of Fresneldiffraction fringes in the photosensitive substrate. For particular mask designthe longitudinal periodicity of Talbot carpet can be avoided producing quasiuniform striped pattern (Talbot stripes). We propose a novel hybridamplitude-phase mask which is engineered for obtaining extremely smooth Talbotstripes and simultaneously high lateral optical contrast and extreme spatialresolution better than a third of laser wavelength. By means of the numericalsimulations, we demonstrate the robustness of produced striped diffractionpatterns against mask design deviation and light incidence angle variations.The reproducibility of the Talbot stripes is reported also for 1D and 2Dmetal-dielectric projection masks.

Talbot photolithography optimization with engineered hybrid metal-dielectric mask: High-contrast and highly-uniform Talbot stripes