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In the present work we report about a parallel-processing ion beamfabrication technique whereby high-density sub-superficial graphiticmicrostructures can be created in diamond. Ion beam implantation is aneffective tool for the structural modification of diamond: in particularion-damaged diamond can be converted into graphite, therefore obtaining anelectrically conductive phase embedded in an optically transparent and highlyinsulating matrix. The proposed fabrication process consists in the combinationof Deep Ion Beam Lithography (DIBL) and Focused Ion Beam (FIB) milling. FIBmicromachining is employed to define micro-apertures in the contact masksconsisting of thin (<10 um) deposited metal layers through which ions areimplanted in the sample. A prototypical single-cell biosensor was realized withthe above described technique. The biosensor has 16 independent electrodesconverging inside a circular area of 20 um diameter (typical neuroendocrinecells size) for the simultaneous recording of amperometric signals.

Realization of a diamond based high density multi electrode array by means of deep ion beam lithography