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The Hydrogenated Diamond Like Carbon (HDLC) thin films are deposited onSilicon substrate at room temperature using asymmetric capacitively coupled RFplasma with varying flow rates of methane. These films are undergone annealingat high vacuum and high temperature furnace. The as-prepared and annealed HDLCfilms have been depth profiled for hydrogen using the resonance at 6.44 MeV innuclear reaction between fluoride ion beam and HDLC. The as prepared filmsexhibit non-uniform depth distribution of hydrogen: it decreases with depth.Annealing in vacuum brings about a significant desorption of hydrogen from thefilms. Loss of hydrogen, albeit in much lower proportions, is also induced bythe bombarding beam. The films also experience a mild loss of carbon, as shownby proton backscattering spectrometry, during high vacuum annealing. The depthprofiles of hydrogen in the annealed films are indicative of the prevalence ofgraphitic carbon near interface between film and substrate.

Study of depth profile of hydrogen in hydrogenated diamond like carbon thin film using ion beam analysis techniques