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Dielectric laser accelerators (DLAs) have proven to be good candidates forminiaturized particle accelerators. They rely on micro-fabricated dielectricswhich are able to modulate the kinetic energy of the incoming electron beamunder a proper laser illumination. In this paper we demonstrate a dual pillarstructure with a distributed Bragg reflector to mimic a double sidedillumination to the electron path. The structure is fabricated by an electronbeam lithography technique followed by a cryogenic reactive ion etchingprocess. Such a structure can accelerate the injected 28 keV electrons by agradient of approximately 150 MeV/m which can be further optimized towards theGeV/m regime.

Silicon dual pillar structure with a distributed Bragg reflector for dielectric laser accelerators: Design and fabrication