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In this work we have synthesised thin films of MgyNi1-y(Hx) metal and metalhydride with y between 0 and 1. The films are deposited by magnetronco-sputtering of metallic targets of Mg and Ni. Metallic MgyNi1-y films weredeposited with pure Ar plasma while MgyNi1-yHx hydride films were depositedreactively with 30% H2 in the Ar plasma. The depositions were done with a fixedsubstrate carrier, producing films with a spatial gradient in the Mg and Nicomposition. The combinatorial method of co-sputtering gives an insight intothe phase diagram of MgyNi1-y and MgyNi1-yHx, and allows us to investigatestructural, optical and electrical properties of the resulting alloys. Ourresults show that reactive sputtering gives direct deposition of metal hydridefilms, with high purity in the case of Mg~2NiH~4. We have observed limitedoxidation after several months of exposure to ambient conditions. MgyNi1-y andMgyNi1-yHx films might be applied for optical control in smart windows, opticalsensors and as a semiconducting material for photovoltaic solar cells.

MgyNi1-y(Hx) thin films deposited by magnetron co-sputtering