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Composition depth profiles of d.c.-plated and pulseplated Fe-Ni alloys havebeen investigated with the reverse depth profile analysis method. When d.c.plating is applied, the mole fraction of iron near the substrate is higher thanduring steadystate deposition since iron is preferentially deposited besidenickel and the achievement of the steadystate deposition condition takes time.The steadystate composition was achieved typically after depositing a90-nm-thick alloy layer. In the pulseplating mode, samples with nearly uniformcomposition could be obtained at a duty cycle of 0.2 or smaller, and acontinuous change in the composition profile could be seen as a function of theduty cycle above this value. A constant sample composition was achieved withpulseplating in a wide peak current density interval. The composition depthprofile was also measured for a wide range of Fe2+ concentration. The differentcharacteristics of the composition depth profile as a function of thedeposition mode can be explained mostly in terms of mass transport effects. Theelucidation of the results is fully in accord with the kinetic models ofanomalous codeposition and with the assumption of the superposition of astationary and a pulsating diffusion layer. The results achieved help toidentify the conditions for the deposition of ultrathin magnetic samples withuniform composition along the growth direction.

Near-substrate composition depth profile of direct current-plated and pulse-plated Fe-Ni alloys