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We demonstrate control of magnetic domain structures in continuous FePd thinfilms by patterning their surfaces with plasma treatment. The Fe-oxide layerformed on the surface upon ambient exposure of the FePd alloy thin film grownon an Al$_2$O$_3$(0001) substrate was patterned into microstructures by e-beamlithography followed by O$_2$- or Ar-plasma treatment. Microscopic pinning ofmagnetic domain walls in the thin films is then observed by magneto-optic Kerreffect microscopy, with the magnetic field needed to reverse the magnetizationof the plasma-treated areas being larger than that for the untreated areas. Anintriguing competition between the uniaxial anisotropy and the exchange bias isalso observed in the system. This study demonstrates that patterning of thefilm surface with plasma treatment can be an easy and efficient method forsophisticated engineering of magnetic structures in thin films, and thereforehas potential application in developing future data-storage and spintronicdevices.

Plasma-induced magnetic patterning of FePd thin films without and with exchange bias