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Oblique angle deposition (OAD) is a nanostructuration method widely used totune the optical properties of thin films. The introduction of porositycontrolled by the deposition angle is used to develop the architecture of eachlayer and stack that enable modifying and optimizing the optical properties ofthe constituent layers for optimal design. However, optical properties of thesenanostructured layers may differ greatly from those of dense layers due to thepresence of anisotropy, refractive index gradient and scattering. This workfocuses on OAD layers based on a reference photonic material such as SiO2 andit aims at taking into account all these effects in the description of theoptical response. For that, the nanostructure has been analyzed with a completeSEM study and key parameters like the porosity gradient profile and aspectratio of the nanocolumns were extracted. The samples were then characterized bygeneralized ellipsometry to evaluate the influence of morphological anisotropyand porosity gradient on the optical response of the films. Based on thismicrostructural study, an original optical model is presented to fit thefeatures of new optical properties. A reliable correspondence is observedbetween the optical model parameters and the microstructure characteristicslike the column angle and the porosity gradient. This demonstrates that suchcomplex microstructural parameters can be easily accessed solely from opticalmeasurements. All the work has enabled us to develop a two-layeranti-reflective coating that already demonstrate high level of transmission.

Optical and nanostructural insights of oblique angle deposited layers applied for photononic coatings