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We have studied the growth of metastable face-centered-cubic, non-magneticFe78Ni22 thin films on silicon substrates. These films undergo a magnetic(paramagnetic to ferromagnetic) and structural (fcc to bcc) phasetransformation upon ion beam irradiation and thus can serve as a template fordirect writing of magnetic nanostructures by the focused ion beam. So far,these films were prepared only on single crystal Cu(100) substrates. We showthat transformable Fe78Ni22 thin films can also be prepared on ahydrogen-terminated Si(100) with a 130-nm-thick Cu(100) buffer layer. TheH-Si(100) substrates can be prepared by hydrofluoric acid etching or byannealing at 1200{\deg}C followed by adsorption of atomic hydrogen. The Cu(100)buffer layer and Fe78Ni22 fcc metastable thin film were deposited by thermalevaporation in an ultra-high vacuum. The films were consequently transformedin-situ by 4keV Ar+ ion irradiation and ex-situ by a 30 keV Ga+ focused ionbeam, and their magnetic properties were studied by magneto-optical Kerr effectmagnetometry. The substitution of expensive copper single crystal substrate bystandard silicon wafers dramatically expands application possibilities ofmetastable paramagnetic thin films for focused ion beam direct magneticpatterning.

The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning