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In this paper, we investigate three-phase eutectic growth during thin-filmdirectional solidification of a model symmetric ternary eutectic alloy. Incontrast to two-phase eutectics that have only a single possibility,${\alpha}{\beta}{\alpha}{\beta}$..., as the growth pattern, during three-phaseeutectic growth infinite possibilities exist. Here, we explore the possibleexistence of pattern selection influenced by the change in the solid-solidinterfacial energies and the diffusivities. We begin the study by estimatingthe undercooling vs. spacing variation for the simplest possible configurationsof pattern lengths 3 and 4, where phase-field simulations are utilized toquantify the influence of the solid-solid interfacial energy and the contrastin the component diffusivities. Subsequently, extended simulations consistingof multiple periods of ${\alpha}{\beta}{\delta}$... as well as${\alpha}{\beta}{\delta}{\beta}$... are carried out for assessing the stabilityof the configurations to long-wavelength perturbations in spacing. Thereafter,growth competition among the simplest patterns is investigated throughphase-field simulations of coupled growth of configurations of the type[${\alpha}{\beta}{\delta}]_m[{\alpha}{\beta}{\delta}{\beta}]_n$, (m,n) beingthe respective number of periods. Finally, pattern selection is studied byinitializing with random initial configurations and classifying the emergingpatterns based on the phase sequences. The principal finding is that, whilethere is no strong phase selection, between the solid-solid interfacialenergies and the contrast in the component diffusivities, we find the latter tostrongly influence pattern morphology.

Role of interfacial energy and liquid diffusivities on pattern formation during thin-film three-phase eutectic growth