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We report optical parallel nanolithography using bowtie apertures with the help of the interferometric-spatial-phase-imaging (ISPI) technique. The ISPI system can detect and control the distance between the bowtie aperture, and photoresist with a resolution of sub-nanometer level. It overcomes the difficulties brought by the light divergence of bowtie apertures. Parallel nanolithography with feature size of 22 ± 5 nm is achieved. This technique combines high resolution, parallel throughput, and low cost, which is promising for practical applications.United States. Defense Advanced Research Projects Agency (Grant N66001-08-1-2037)National Science Foundation (U.S.) (Grant CMMI-1120577

Optical nanolithography with λ/15 resolution using bowtie aperture array