English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Tools annual

Global: Zendy Free Plan

Global: Zendy Tools monthly

Global: Zendy Plus monthly

The effect of ultrashort laser-induced morphological changes upon irradiationof silicon with double pulse sequences is investigated under conditions thatlead to mass removal. The temporal delay between twelve double and equal-energypulses (Ep=0.24J/cm2 each, with pulse duration tp=430fs, 800nm laserwavelength) was varied between 0 and 14ps and a decrease of the damaged area,crater depth size and periodicity of the induced subwavelength ripples (by3-4%) was observed with increasing pulse delay. The proposed underlyingmechanism is based on the combination of carrier excitation and energythermalization and capillary wave solidification and aims to provide analternative explanation to the control of ripple periodicity by temporal pulsetailoring. This work demonstrates the potential of pulse shaping technology toimprove nano/micro processing.

The influence of ultrafast temporal energy regulation on the morphology of Si surfaces through femtosecond double pulse laser irradiation