English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Plus monthly

Global: Zendy Tools annual

Global: Zendy Tools monthly

Global: Zendy Free Plan

A simple and effective method to fabricate a high fill-factor triangularmicrolens array using the proximity printing in lithography process isreported. The technology utilizes the UV proximity printing by controlling aprinting gap between the mask and substrate. The designed approximate trianglemicrolens array pattern can be fabricated the high fill-factor triangularmicrolens array in photoresist. It is due to the UV light diffraction todeflect away from the aperture edges and produce a certain exposure inphotoresist material outside the aperture edges. This method can preciselycontrol the geometric profile of high fill factor triangular microlens array.The experimental results showed that the triangular micro-lens array inphotoresist could be formed automatically when the printing gap ranged from 240micrometers to 840 micrometers. The gapless triangular microlens array will beused to increases of luminance for backlight module of liquid crystal displays.

New high fill-factor triangular micro-lens array fabrication method using UV proximity printing