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The solution of a boundary-value problem formulated for a modifiedKretschmann configuration shows that the phase speed of a surface-plasmon waveguided by the planar interface of a sufficiently thin metal film and a chiralsculptured thin film (STF) depends on the vapor incidence angle used whilefabricating the chiral STF by physical vapor depoistion. Therefore, it may bepossible to engineer the phase speed quite simply by selecting an appropriatevalue of the vapor deposition angle (in addition to the metal and the evaporantspecies).

Engineering the phase speed of surface-plasmon wave at the planar interface of a metal and a chiral sculptured thin film