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We have studied the effect of annealing temperature on the statisticalproperties of $WO_3$ surface using atomic force microscopy techniques (AFM). Wehave applied both level crossing and structure function methods. Level crossinganalysis indicates an optimum annealing temperature of around 400$^oC$ at whichthe effective area of the $WO_3$ thin film is maximum, whereas composition ofthe surface remains stoichiometric. The complexity of the height fluctuation ofsurfaces was characterized by roughness, roughness exponent and lateral size ofsurface features. We have found that there is a phase transition at around400$^oC$ from one set to two sets of roughness parameters. This happens due tomicrostructural changes from amorphous to crystalline structure in the samplesthat has been already found experimentally.

The Effect of Annealing Temperature on Statistical Properties of $WO_3$ Surface