Open AccessA Study for Stable End Point Detection in 90 nm WSix/poly-Si Stack-down Gate Etching Process
Author(s) -
Y. W. Ko,
HuiGon Chun,
Jing-Hyuk Lee
Publication year - 2005
Publication title -
jeon'gi jeonja jaeryo haghoe nonmunji/jeon-gi jeonja jaeryo hakoe nonmunji
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2005.18.3.206
Subject(s) - materials science , wafer , etching (microfabrication) , stack (abstract data type) , optoelectronics , gate oxide , scanning electron microscope , plasma etching , nanotechnology , layer (electronics) , electrical engineering , composite material , transistor , computer science , engineering , voltage , programming language