z-logo
open-access-imgOpen Access
Fully CMOS-compatible Process Integration of Thin film Inductor with a Sputtered Bottom NiFe Core
Publication year - 2003
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2003.16.2.138
Subject(s) - inductor , materials science , core (optical fiber) , polyimide , etching (microfabrication) , optoelectronics , magnetic core , electrical engineering , stack (abstract data type) , voltage , layer (electronics) , composite material , electromagnetic coil , engineering , computer science , programming language

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom