Open AccessESR Studies of Active Free Radicals Produced in the Degradation Processes of Phenol Derivatives on the Surface of Superfine Colloid Particles
Author(s) -
Hai Wang,
Dewen Chen,
G. Xu
Publication year - 1994
Publication title -
wuli huaxue xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.396
H-Index - 37
ISSN - 1000-6818
DOI - 10.3866/pku.whxb19940705
Subject(s) - radical , colloid , phenol , degradation (telecommunications) , chemistry , chemical engineering , photochemistry , organic chemistry , telecommunications , computer science , engineering