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FORMULATION AND EVALUATION OF COSMETIC FOUNDATION USING EPIGALLOCATECHIN GALLATE AS A SUN PROTECTION
Author(s) -
Effionora Anwar,
Shifa Rizkamiarty
Publication year - 2020
Publication title -
international journal of applied pharmaceutics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.238
H-Index - 15
ISSN - 0975-7058
DOI - 10.22159/ijap.2020.v12s1.ff029
Subject(s) - lotion , sun protection factor , irritation , cosmetics , dermatology , chemistry , chromatography , medicine , organic chemistry , immunology
Objective: The objective of the study was to obtain a lotion foundation using epigallocatechin gallate (EGCG) as an active ingredient designed with asun protection factor (SPF) value around 30 that can effectively protect facial skin from ultraviolet radiation (UVR) exposure and that is safe to use.Methods: In this study, we determine SPF value using UV–visible spectrophotometry at a wavelength between 290 and 320 nm. The preparationformula of the foundation was made with an EGCG concentration of 0.4%, a concentration which can yield the desired SPF value of about 30. Physicalstability was performed at low (4±2°C), ambient (25±2°C), and high (40±2°C) temperatures; cycling and centrifugation tests were also conducted.Safety was evaluated by eye irritation test using hen’s egg test on chorioallantois method and skin irritation test using the Draize and patch testsmethod.Results: The SPF values of 0.04% EGCG and lotion foundation containing 0.4% EGCG were 31.02±0.72 and 33.20±0.59, respectively. The results ofcycling and centrifugal tests indicated that lotion foundation showed an absence of crystals and lack of any phase separation between oil and waterphases. The physical stability test showed no significant changes for all parameters. Safety tests resulted in neither skin nor eye irritation.Conclusion: The EGCG foundation developed was physically stable with a good appearance and did not irritate the skin or eyes thus are safe to usealso can effectively protect skin against UVR exposure.

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