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53.2: Invited Paper : Large‐Area Color‐Patterning Technology for AMOLED
Author(s) -
Suh Min Chul,
Kang Tae Min,
Cho Sung Woo,
Kwon Young Gil,
Kim Hye Dong,
Chung Ho Kyoon
Publication year - 2009
Publication title -
sid symposium digest of technical papers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.351
H-Index - 44
eISSN - 2168-0159
pISSN - 0097-966X
DOI - 10.1889/1.3256909
Subject(s) - materials science , oled , amoled , brightness , fabrication , optoelectronics , laser , stack (abstract data type) , thermal stability , optics , nanotechnology , layer (electronics) , computer science , thin film transistor , chemistry , medicine , physics , alternative medicine , pathology , active matrix , programming language , organic chemistry
In this paper, we describe a novel color patterning method for the fabrication of large area full‐color AMOLEDs. Laser Induced Thermal Imaging (LITI) is a laser addressed thermal patterning technology with unique advantages such as excellent uniformity of transfer film thickness, capability of multilayer stack transfer, high resolution and scalability to large‐Size mother glass. We developed and optimized transfer films, structure of OLED layers, and laser scanning conditions for the patterning of evaporated small molecules. As a result, we achieved excellent LITI device stability which yielded the device life time more than 25,000 hrs at 250 cd/m 2 white brightness.
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