Open AccessNanopatterning of atomic layer deposited Al:ZnO films using electron beam lithography for waveguide applications in the NIR region
Author(s) -
Kevin Santiago,
R. Mundle,
Chandan B. Samantaray,
M. Bahoura,
A. K. Pradhan
Publication year - 2012
Publication title -
optical materials express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.925
H-Index - 66
ISSN - 2159-3930
DOI - 10.1364/ome.2.001743
Subject(s) - materials science , electron beam lithography , lithography , atomic layer deposition , layer (electronics) , optoelectronics , stencil lithography , optics , x ray lithography , waveguide , cathode ray , resist , electron , nanotechnology , physics , quantum mechanics
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