Open AccessRemoval of Oxides and Surface Texturization of Crystalline Si Wafer by Ion Beam Etching
Author(s) -
Yan Li,
Yoshimine Kato
Publication year - 2019
Publication title -
destech transactions on computer science and engineering
Language(s) - English
Resource type - Journals
ISSN - 2475-8841
DOI - 10.12783/dtcse/ccme2018/28659
Subject(s) - wafer , etching (microfabrication) , hydrofluoric acid , materials science , silicon , fabrication , isotropic etching , reactive ion etching , layer (electronics) , ion beam , crystalline silicon , ion , nanotechnology , optoelectronics , chemistry , metallurgy , medicine , alternative medicine , organic chemistry , pathology