Open AccessSimulations of Si and SiO2Etching in SF6+O2Plasma
Author(s) -
R. Knizikevičius
Publication year - 2010
Publication title -
acta physica polonica. a
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.217
H-Index - 38
eISSN - 1898-794X
pISSN - 0587-4246
DOI - 10.12693/aphyspola.117.478
Subject(s) - materials science , etching (microfabrication) , plasma , plasma etching , silicon , analytical chemistry (journal) , nanotechnology , optoelectronics , nuclear physics , physics , chemistry , environmental chemistry , layer (electronics)