Open AccessSuspended single-crystalline oxide structures on silicon through wet-etch techniques: Effects of oxygen vacancies and dislocations on etch rates
Author(s) -
Zheng Hui Lim,
Matthew Chrysler,
Abinash Kumar,
Jacob P. Mauthe,
Divine P. Kumah,
Chris Richardson,
James M. LeBeau,
J. H. Ngai
Publication year - 2019
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5135035
Subject(s) - microscale chemistry , materials science , photoresist , etching (microfabrication) , oxide , potassium hydroxide , layer (electronics) , substrate (aquarium) , silicon , nanotechnology , oxygen , optoelectronics , chemical engineering , isotropic etching , microelectromechanical systems , chemistry , metallurgy , oceanography , mathematics education , mathematics , organic chemistry , geology , engineering